The new parameter for Si surface characterization and the critical cleaning step.
| Autor: | Nemoto, K., Funabashi, M., Ikeda, S., Kuwabara, M., Sasaki, Y., Yabuoshi, N., Suzuki, N., Koike, A. |
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| Zdroj: | 2003 5th International Conference on ASIC. Proceedings (IEEE Cat. No.03TH8690); 2003, p225-228, 4p |
| Databáze: | Complementary Index |
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