The high quality low temperature oxidation technology in a quasi self-aligned SiGe HBT.
| Autor: | Li-Shyue Lai, Yang-Tai Tseng, Lurng-Sheng Lee, Yuh-Sheng Jean, Yu-Min Hsu, Hang-Ping Hwang, Shin-Chii Lu, Ming-Jim Tsai |
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| Zdroj: | 2001 International Symposium on Electron Devices for Microwave & Optoelectronic Applications. EDMO 2001 (Cat. No.01TH8567); 2001, p77-82, 6p |
| Databáze: | Complementary Index |
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