A new chemical mechanical planarization with the frozen chemical etchant as a polishing pad.
| Autor: | Yil-Wook Kim, Jae-Ok Yoo, Tae Woo Jung, Youn-Jin Oh, Chan-Hwa Chung |
|---|---|
| Zdroj: | 2001 International Semiconductor Device Research Symposium. Symposium Proceedings (Cat. No.01EX497); 2001, p30-33, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|