Plasma doping system for 200 and 300 mm wafers.
| Autor: | Liebert, R.B., Walther, S.R., Felch, S.B., Ziwei Fang, Pedersen, B.O., Hacker, D. |
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| Zdroj: | 2000 International Conference on Ion Implantation Technology Proceedings Ion Implantation Technology - 2000 (Cat. No.00EX432); 2000, p472-475, 4p |
| Databáze: | Complementary Index |
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