Performance characteristics of the Varian VIISta 810 single wafer medium current ion implanter.
| Autor: | Renau, A., Scheuer, J.T., Brennan, D., Todorov, S.S., Cucchetti, A., Olson, J.C. |
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| Zdroj: | 2000 International Conference on Ion Implantation Technology Proceedings Ion Implantation Technology - 2000 (Cat. No.00EX432); 2000, p435-438, 4p |
| Databáze: | Complementary Index |
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