Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID.
| Autor: | Cha, C.L., Vassiliev, V., Chor, E.F., See, A.K. |
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| Zdroj: | 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479); 2000, p38-41, 4p |
| Databáze: | Complementary Index |
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