Physical removal of nano-scale defects from surfaces.
| Autor: | Busnaina, A.A., Hong Lin |
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| Zdroj: | 13th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference. Advancing the Science & Technology of Semiconductor Manufacturing. ASMC 2002 (Cat. No.02CH37259); 2002, p272-277, 6p |
| Databáze: | Complementary Index |
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