Advanced doping and millisecond annealing for ultra-shallow junctions for 65 nm and beyond.
| Autor: | McCoy, S.P., Arevalo, E.A., Gelpey, J.C., Downey, D.F. |
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| Zdroj: | 12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004; 2004, p99-108, 10p |
| Databáze: | Complementary Index |
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