Lightpipe proximity effects on Si wafer temperature in rapid thermal processing tools.

Autor: Kreider, K.G., Chen, D.H., DeWitt, D.P., Kimes, W.A., Tsai, B.K.
Zdroj: 11th IEEE International Conference on Advanced Thermal Processing of Semiconductors. RTP 2003; 2003, p125-129, 5p
Databáze: Complementary Index