Effects of wafer emissivity on rapid thermal processing temperature measurement.
Autor: | Chen, D.H., DeWitt, D.P., Tsai, B.K., Kreider, K.G., Kimes, W.A. |
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Zdroj: | 10th IEEE International Conference of Advanced Thermal Processing of Semiconductors; 2002, p59-67, 9p |
Databáze: | Complementary Index |
Externí odkaz: |