Effects of wafer emissivity on rapid thermal processing temperature measurement.

Autor: Chen, D.H., DeWitt, D.P., Tsai, B.K., Kreider, K.G., Kimes, W.A.
Zdroj: 10th IEEE International Conference of Advanced Thermal Processing of Semiconductors; 2002, p59-67, 9p
Databáze: Complementary Index