Behaviors and physical degradation of HfSiON MOSFET linked to strained CESL performance booster.

Autor: Kidan Bae, Minjung Jin, Hajin Lim, Lira Hwang, Dongseok Shin, Junekyun Park, Jinchul Heo, Jongho Lee, Jinho Do, Ilchan Bae, Chulhee Jeon, Jongwoo Park
Zdroj: 2011 IEEE International Reliability Physics Symposium (IRPS); 2011, pPL.1.1-PL.1.5, 1p
Databáze: Complementary Index