In situ XPS investigation of the chemical surface composition during the ALD of ultra-thin aluminum oxide films.
| Autor: | Geidel, M., Knaut, M., Albert, M., Bartha, J.W. |
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| Zdroj: | 2011 Semiconductor Conference Dresden (SCD); 2011, p1-4, 4p |
| Databáze: | Complementary Index |
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