Simulation and optimization of Tri-Gates in a 22 nm hybrid Tri-Gate/planar process.
| Autor: | Baldauf, T., Wei, A., Illgen, R., Flachowsky, S., Herrmann, T., Feudel, T., Ho?ntschel, J., Horstmann, M., Klix, W., Stenzel, R. |
|---|---|
| Zdroj: | 2011 12th International Conference on Ultimate Integration on Silicon (ULIS); 2011, p1-4, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|