| Autor: |
Rodzi, Ana Syahidah, Mamat, Mohamad Hafiz, Zahidi, Musa Mohamed, Mohd, Yusairie, Berhan, Mohamad Nor, Rusop, Mohamad |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings; 5/25/2011, Vol. 1341 Issue 1, p77-81, 5p, 1 Black and White Photograph, 2 Charts, 5 Graphs |
| Abstrakt: |
This paper carried out to investigate the different potentials due to 500° C annealing temperatures. The potentials range from -1.0 to -1.4 V were deposited by electrochemical deposition technique that consist three electrode used. Cyclic voltammogram graph was studies to determine the potentials for deposit the ZnO and chronoamprometry graph for investigate current-time during deposition process occurred. The surface morphology of ZnO film was observed by using field emission scanning electron microscopy (FESEM). It shown the images for all potentials after annealing in oxygen gas and diameter of ZnO sizes film was increasing when the potential was smaller. The roughness of ZnO films were investigate by measuring using surface profiler and the result shown that less roughness at high potentials. XRD patterns of ZnO films crystallites at different potentials and at -1.2 V have high peak intense with (002) plane as preferential axis structures in annealing process. The PL spectra reveal the ZnO crystal has UV emission band around 380 nm. These results will provide new technique to produce nanorod of ZnO film and also can fabricate for optoelectronic devices applications. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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