Chemomechanical polishing of silica and silicon by fluoride- and oxide-based reagents: identification of a reaction intermediate.
| Autor: | Boyle, David S., Winfield, John M. |
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| Zdroj: | Journal of Materials Chemistry; 1996, Vol. 6 Issue 2, p227-232, 6p |
| Databáze: | Complementary Index |
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