Studies of the effects of NF3 on the growth of polysilicon films by low-pressure CVD. Part 3.―Effect on composition.
| Autor: | Hitchman, Michael L., Zhao, Junfu, Shamlian, Sarkis H., Affrossman, Stanley, Hartshorne, Mark, Maydell, Ewa A., Kheyrandish, Hamid |
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| Zdroj: | Journal of Materials Chemistry; Dec1994, Vol. 4 Issue 12, p1835-1842, 8p |
| Databáze: | Complementary Index |
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