| Autor: |
Smy, Tom, Tan, Liang, K. Chan, Tait, R. N., Broughton, James N., Dew, Steven K., Brett, Michael J. |
| Předmět: |
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| Zdroj: |
IEEE Transactions on Electron Devices; Jul98, Vol. 45 Issue 7, p1414, 12p, 27 Black and White Photographs, 4 Diagrams, 6 Graphs |
| Abstrakt: |
Presents a study which investigated a number of unique aspects involved in the simulation of long sputter system for the deposition of refractory metal barriers. Methodology used in the study; Simulation study of long throw sputtering; Results of the study; Conclusion. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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