| Autor: |
Shukla, S. K., Sindal, B. K., Bansod, Tripti, Kumar, Kvanps |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings; 6/25/2012, Vol. 1451 Issue 1, p218-220, 3p |
| Abstrakt: |
Non-evaporable Getter coatings are the recent developments in the field of UHV/XHV technology. They transform the source of gases i.e. the inner walls of vacuum vessel to a pump for gases and thus they provide large pumping speed without conductance limitation. Development of NEG coating technology has been started at UHVTD, RRCAT Indore. DC magnetron sputtering systems are generally used for coating of Ti-Zr-V alloys used as NEG films. Since the materials used for NEG coating were reactive and it was also very important to maintain purity of coated film. An all metal UHV system was required for ensuring high purity of discharge gas. System was also equipped with an all metal gas inlet system having provision for liquid Nitrogen trapping of impurity gases. An auxiliary UHV system was also appended to check gas purity during the coating process. This UHV compatible, cylindrical magnetron sputtering system was developed in-house. This paper describes the design details and vacuum performance of the system. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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