Formation of aluminum nitride films on GaAs(110) at room temperature by reactive molecular-beam epitaxy: X-ray and soft x-ray photoemission spectroscopy.

Autor: Baier, H.-U., Mönch, W.
Předmět:
Zdroj: Journal of Applied Physics; 7/15/1990, Vol. 68 Issue 2, p586, 5p
Abstrakt: Presents information on a study which prepared Al[subx]N[sub1-x] films on gallium arsenide(110) surfaces at room temperature by simultaneous evaporation of aluminum and exposure to a beam of ammonia molecules. Chambers of the photoelectron spectrometer; Evaluation of the minimum flux density of ammonia; Formation of aluminum nitride.
Databáze: Complementary Index