Chemical removal of contaminants from thin film Bi4Sr3Ca3Cu4O16+x surfaces.
Autor: | Vasquez, R. P., Housley, R. M. |
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Předmět: | |
Zdroj: | Journal of Applied Physics; 6/1/1990, Vol. 67 Issue 11, p7141, 4p, 2 Graphs |
Abstrakt: | Presents an overview of a study which discussed the use of a solution of bromine in absolute ethanol in treating Bi-Sr-Ca-Cu-O thin films. Material used in x-ray photoelectron epectroscopy accumulation; Measurement of the oxygen 1s non superconducting species; Description of the calcium 2p photoelectron lines. |
Databáze: | Complementary Index |
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