Target magnetic-field effects on deposition rate in rf magnetron sputtering.

Autor: Furuya, Akinori, Hirono, Shigeru
Předmět:
Zdroj: Journal of Applied Physics; 7/1/1990, Vol. 68 Issue 1, p304, 7p
Abstrakt: Presents information on a study which described film deposition rates for radio frequency planar magnetron sputtering when the magnetic field parallel to the target surface is varied. Methods; Results; Discussion.
Databáze: Complementary Index