Target magnetic-field effects on deposition rate in rf magnetron sputtering.
Autor: | Furuya, Akinori, Hirono, Shigeru |
---|---|
Předmět: | |
Zdroj: | Journal of Applied Physics; 7/1/1990, Vol. 68 Issue 1, p304, 7p |
Abstrakt: | Presents information on a study which described film deposition rates for radio frequency planar magnetron sputtering when the magnetic field parallel to the target surface is varied. Methods; Results; Discussion. |
Databáze: | Complementary Index |
Externí odkaz: |