| Autor: |
Augustine, B. H., Irene, E. A., He, Y. J., Price, K. J., McNeil, L. E., Christensen, K. N., Maher, D. M. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 9/15/1995, Vol. 78 Issue 6, p4020, 11p, 1 Chart, 7 Graphs |
| Abstrakt: |
Examines the fabrication, chemical, optical and photoluminescence characterization of amorphous silicon-rich oxynitride thin films by plasma-enhance chemical-vapor deposition. Experimental conditions; Characterization of film materials; Conclusions. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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