A detailed experimental study of the wet oxidation kinetics of AlxGa1-xAs layers.
| Autor: | Nickel, H. |
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| Zdroj: | Journal of Applied Physics; 10/15/1995, Vol. 78 Issue 8, p5201, 3p, 5 Graphs |
| Abstrakt: | Focuses on a study which investigated the oxidation in water vapor of thick AlGaAs layers with aluminum contents grown by molecular beam epitaxy. Oxidation depth of AlGaAs layers; Correlation between oxidation rate and aluminum at different furnace temperatures; Activation energies of aluminum content of AlGaAs. |
| Databáze: | Complementary Index |
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