Effect of growth conditions on the structural properties of ion beam sputter deposited SiGe epilayers.

Autor: Lyakas, M., Arazi, T., Eizenberg, M., Demuth, V., Strunk, H. P., Mosleh, N., Meyer, F., Schwebel, C.
Předmět:
Zdroj: Journal of Applied Physics; 10/15/1995, Vol. 78 Issue 8, p4975, 7p, 3 Black and White Photographs, 2 Charts, 3 Graphs
Abstrakt: Deals with a study which examined the structural properties of silicon germanium layers epitaxially grown on silicon by ion beam sputter deposition. Experimental procedures; Effect of growth temperature on the epilayers properties; Temperature dependence of surface topology.
Databáze: Complementary Index