Monte Carlo model for the deposition of electronic energy in solid argon thin films by keV electrons.

Autor: Vidal, R., Baragiola, R. A., Ferrón, J.
Předmět:
Zdroj: Journal of Applied Physics; 11/15/1996, Vol. 80 Issue 10, p5653, 6p, 2 Charts, 8 Graphs
Abstrakt: Presents a study which investigated the motion of KeV electrons in a film of solid argon and the depth distribution of ionizations and excitations through the Monte Carlo simulation. Characteristics of the Monte Carlo simulation method; Discussion on the depth distributions of ionizations and excitations; Discussion on the effect of the substrate.
Databáze: Complementary Index