Photon-assisted oxidation of the GaAs(100) surface using water at 90 K.

Autor: Ettedgui, E., Park, Ken T., Cao, Jianming, Gao, Y., Ruckman, M. W.
Předmět:
Zdroj: Journal of Applied Physics; 5/15/1995, Vol. 77 Issue 10, p5411, 7p, 1 Chart, 5 Graphs
Abstrakt: Presents a study that examined the interaction of water with gallium arsenide (100) semiconductor using photoelectron spectroscopy. Methodology; Analysis of the energy distribution curves of the interaction; Assessment of the condensation of water in the semiconductor.
Databáze: Complementary Index