| Autor: |
Davis, G. M., Zhang, L., Chandler, P. J., Townsend, P. D. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 3/15/1996, Vol. 79 Issue 6, p2863, 5p, 1 Black and White Photograph, 1 Diagram, 5 Graphs |
| Abstrakt: |
Presents information on a study which used multiple energy helium ion implantation to increase the width of the implantation-induced refraction index barrier in lithium boron[sub3] oxygen[sub5] (LBO). Background on the LBO crystals used in the experiments; Fabrication of channel waveguides in LBO; Conclusion. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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