Process-induced strains in dry etched semiconductor nanostructures studied by photoreflectance.
| Autor: | Tang, Y. S., Wang, P. D., Sotomayor Torres, C. M., Lunn, B., Ashenford, D. E. |
|---|---|
| Předmět: | |
| Zdroj: | Journal of Applied Physics; 6/15/1995, Vol. 77 Issue 12, p6481, 4p, 3 Graphs |
| Abstrakt: | Presents a study which focused on the process-induced strains in dry etched semiconductor nanostructures studied by photoreflectance. Experimental details; Results and discussion; Conclusion. |
| Databáze: | Complementary Index |
| Externí odkaz: |
|