| Autor: |
Marieb, T., Flinn, P., Bravman, J. C., Gardner, D., Madden, M. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 7/15/1995, Vol. 78 Issue 2, p1026, 7p, 9 Black and White Photographs |
| Abstrakt: |
Focuses on a study which detailed an observation on electromigration voiding in passivated pure aluminum lines in situ using high voltage scanning electron microscopy. Types of lines investigated; Requirement of microstructural sites; Effect of the microstructure of the lines on the void motion. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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