Structural imperfections in amorphous e-beam deposited and ion-beam-mixed Cu–Zr films tested by exoelectron emission.

Autor: Dekhtyar, Yu., Katashev, A., Kovalevsky, A., Karpe, N.
Předmět:
Zdroj: Journal of Applied Physics; 1/15/1996, Vol. 79 Issue 2, p1078, 4p, 1 Chart, 3 Graphs
Abstrakt: Focuses on the study of structural imperfections in solids through the photothermostimulated exoelectron emission. Effect of the concentration of structural imperfections on the number of emitted electrons; Description of the preparation of thin films of amorphous copper-zirconium (Cu-Zr); Comparison of the electron emission intensity between ion-beam mixed Cu-Zr and e-beam deposited films having similar composition.
Databáze: Complementary Index