| Autor: |
Ljungcrantz, H., Odén, M., Hultman, L., Greene, J. E., Sundgren, J.-E. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 12/15/1996, Vol. 80 Issue 12, p6725, 9p, 2 Diagrams, 11 Charts |
| Abstrakt: |
Investigates the mechanical properties of (001)-, (011)-, and (111)-oriented MgO wafers and TiN overlayers grown by direct current magnetron sputter deposition in a mixed nitrogen[sub2] and argon discharge, suing nanoindentation. Applications for TiN thin films; Factors that influence the properties of TiN layers; Description of the growth of TiN films; Analysis of the microstructure of regions around indentations in as-deposited TiN (001) and TiN (111) films. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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