Laser-induced etching of Si surfaces: The effect of weak background light.
Autor: | Grebel, H., Gayen, T., Wu, H-W. |
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Předmět: | |
Zdroj: | Journal of Applied Physics; 4/15/1996, Vol. 79 Issue 8, p4414, 4p, 1 Black and White Photograph, 3 Diagrams, 5 Graphs |
Abstrakt: | Provides information on a study which used two different lasers to etch patterns on silicon surfaces employing a thin film cell configuration. Experiment; Results and discussion; Conclusion. |
Databáze: | Complementary Index |
Externí odkaz: |