Laser-induced etching of Si surfaces: The effect of weak background light.

Autor: Grebel, H., Gayen, T., Wu, H-W.
Předmět:
Zdroj: Journal of Applied Physics; 4/15/1996, Vol. 79 Issue 8, p4414, 4p, 1 Black and White Photograph, 3 Diagrams, 5 Graphs
Abstrakt: Provides information on a study which used two different lasers to etch patterns on silicon surfaces employing a thin film cell configuration. Experiment; Results and discussion; Conclusion.
Databáze: Complementary Index