| Autor: |
Reyna, L. G., Sobeˇhart, J. R. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 9/1/1995, Vol. 78 Issue 5, p3423, 5p |
| Abstrakt: |
Presents a study that examined multilayer polyimide structures which can be used as an etch stop mechanism in laser ablation processing. Disadvantages of the repitition rate in the ablation of multilayer structures; Discussion on the number of layers in ceramic modules for the packaging of semiconductor devices; Methods in achieving the actual patterning of the polymer. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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