| Autor: |
Rava, P., Crovini, G., Demichelis, F., Giorgis, F., Pirri, C. F. |
| Předmět: |
|
| Zdroj: |
Journal of Applied Physics; 10/1/1996, Vol. 80 Issue 7, p4116, 8p, 1 Diagram, 10 Graphs |
| Abstrakt: |
Investigates the effects of dissipated power and gas dwell time in plasmas on the properties of thin films deposited by plasma-enhanced chemical-vapor deposition. Experimental details; Result of optical, structural and electrical characterizations; Findings of the study. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
|
