Positron annihilation spectroscopy applied to porous silicon films.

Autor: Knights, A. P., Kowalski, G., Saleh, A. S., Towner, A., Patel, M. I., Rice-Evans, P. C., Moore, M., Gledhill, G. A., Nossarzewska-Orlowska, E., Brzozowski, A.
Předmět:
Zdroj: Journal of Applied Physics; 10/1/1995, Vol. 78 Issue 7, p4411, 5p
Abstrakt: Presents a study which described measurements of porous silicon using a monoenergetic positron beam in conjunction with the Doppler broadening technique. Appropriateness of the technique to thin porous silicon layers; Effects of etching porous silicon using hydrofluoric acid; Information on the photoluminescence spectra measured from the samples.
Databáze: Complementary Index