Influence of rapid thermal annealing and internal gettering on Czochralski-grown silicon. II. Light beam induced current study of recombination centers.

Autor: Ehret, E., Maddalon-Vinante, C.
Předmět:
Zdroj: Journal of Applied Physics; 3/1/1996, Vol. 79 Issue 5, p2712, 5p, 2 Diagrams, 2 Charts, 2 Graphs
Abstrakt: Provides information on a study that reported results concerning the generation of recombination centers induced by rapid thermal annealing and by the combination of this heat pulse with an internal gettering process. Experimental procedure; Results and discussion on the study; Conclusion.
Databáze: Complementary Index