The effect of plasma pretreatments on interface state electron emission in Si3N4–GaAs structures.

Autor: Wang, Q. H., Bowser, M. I., Swanson, J. G.
Předmět:
Zdroj: Journal of Applied Physics; 6/1/1995, Vol. 77 Issue 11, p5793, 9p
Abstrakt: Presents information on a study which discussed the static and dynamic properties of interface states between silicon nitride and n-gallium arsenide (GaAs). Pretreatments made using metal-insulator-semiconductor capacitance-voltage; Information on current transient spectroscopy applied to GaAs; Transient spectroscopy observations.
Databáze: Complementary Index