| Autor: |
Bergstrom, D. B., Petrov, I., Allen, L. H., Greene, J. E. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 7/1/1995, Vol. 78 Issue 1, p194, 10p, 7 Diagrams, 9 Graphs |
| Abstrakt: |
Deals with a study that examined the reaction paths and kinetics of aluminide formation in aluminum/epitaxial-W(001) model diffusion barrier systems. Importance of understanding the microchemical and microstructural interfacial reaction paths affecting the integrity of layers used in applications; Changes in bilayer sheet resistance; Determination of reaction kinetics and activation energies. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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