Reaction kinetics in the Ti/SiO2 system and Ti thickness dependence on reaction rate.
| Autor: | Russell, S. W., Strane, J. W., Mayer, J. W., Wang, S. Q. |
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| Zdroj: | Journal of Applied Physics; 7/1/1994, Vol. 76 Issue 1, p257, 7p, 12 Graphs |
| Abstrakt: | Presents a study which investigated the reaction kinetics of titanium films on silicon dioxide using Rutherford backscattering spectrometry. Experimental methods; Results; Discussion. |
| Databáze: | Complementary Index |
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