Oxide, interface, and border traps in thermal, N2O, and N2O-nitrided oxides.

Autor: Fleetwood, D. M., Saks, N. S.
Předmět:
Zdroj: Journal of Applied Physics; 2/1/1996, Vol. 79 Issue 3, p1583, 12p, 4 Charts, 12 Graphs
Abstrakt: Deals with a study which evaluated the trapping properties of N[sub2]O and N[sub2]O-nitrided oxides by thermally stimulated current. Description of the device processing; Irradiation and high-field stress; Summary and conclusions.
Databáze: Complementary Index