Oxide, interface, and border traps in thermal, N2O, and N2O-nitrided oxides.
Autor: | Fleetwood, D. M., Saks, N. S. |
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Zdroj: | Journal of Applied Physics; 2/1/1996, Vol. 79 Issue 3, p1583, 12p, 4 Charts, 12 Graphs |
Abstrakt: | Deals with a study which evaluated the trapping properties of N[sub2]O and N[sub2]O-nitrided oxides by thermally stimulated current. Description of the device processing; Irradiation and high-field stress; Summary and conclusions. |
Databáze: | Complementary Index |
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