Physical damage in silicon formed by helicon wave plasma etching.
| Autor: | Tsukada, Tsutomu, Nogami, Hiroshi, Hayashi, Jun, Kawaguchi, Kazu, Hara, Tohru |
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| Zdroj: | Journal of Applied Physics; 11/1/1993, Vol. 74 Issue 9, p5402, 4p, 7 Graphs |
| Abstrakt: | Presents a study which examined the physical damage formed on silicon by helicon wave oxygen plasma. Experimental procedures used; Analysis of the origin of damage density variations; Factor that contributed to the increase in damage density. |
| Databáze: | Complementary Index |
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