Inverse modeling of impact ionization rate through comparison of Monte Carlo simulation of Si metal-oxide-semiconductor device characteristics and experimental results.

Autor: Imanaga, Syunji, Hane, Kunio, Hayafuji, Yoshinori
Předmět:
Zdroj: Journal of Applied Physics; 11/1/1993, Vol. 74 Issue 9, p5859, 8p
Abstrakt: Presents a study which compared the characteristics of a silicon-metal-oxide semiconductor device provided by Monte Carlo simulation and experimental results. Appraisal of the degree of agreement between simulated and experimental results of drain current versus drain voltage; Calculation of the impact ionization rate; Discussion of the boundary conditions in solving Poisson's equation related to the study.
Databáze: Complementary Index