| Autor: |
Estrada, W., Fantini, M. C. A., de Castro, S. C., Polo da Fonseca, C. N., Gorenstein, A. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 11/1/1993, Vol. 74 Issue 9, p5835, 7p |
| Abstrakt: |
Presents a study in which cobalt oxide thin films with different stoichiometrics were deposited by reactive radio frequency sputtering. Result of the variation of the oxygen partial pressure; Investigation of the electrochromic properties of the thin films in aqeous electrolytes; Characterization of as-sputtered films. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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