Transient annealing as a tool for the investigation of thin-film–substrate solid-phase reactions.

Autor: Bentini, G. G., Nipoti, R., Berti, M., Drigo, A. V., Cohen, C.
Předmět:
Zdroj: Journal of Applied Physics; 8/1/1985, Vol. 58 Issue 3, p1234, 6p
Abstrakt: Analyzes the solid-phase reaction of a thin film and a substrate induced by a transient annealing in the solid phase. Application of Rutherford backscattering analysis technique; Problem of computation of temperature profile induced on a sample by the scanning of a line-shaped energy beam; Result of localized x-ray diffraction analyses.
Databáze: Complementary Index