Ion beam rehydrogenation and post-hydrogenation of a-Si:H.
Autor: | Tsuo, Y. S., Deng, X. J., Smith, E. B., Xu, Y., Deb, S. K. |
---|---|
Předmět: | |
Zdroj: | Journal of Applied Physics; 8/1/1988, Vol. 64 Issue 3, p1604, 4p, 1 Chart, 2 Graphs |
Abstrakt: | Presents a study which examined the rehydrogenation and post-hydrogenation of hydrogenated amorphous silicon using a Kaufman ion beam source. Experimental details; Information on the Kaufman ion beam source; Conclusion. |
Databáze: | Complementary Index |
Externí odkaz: |