Electron-paramagnetic-resonance study of heat-treatment centers in n-type silicon.

Autor: Bekman, H. H. P. Th., Gregorkiewicz, T., van Wezep, D. A., Ammerlaan, C. A. J.
Předmět:
Zdroj: Journal of Applied Physics; 12/1/1987, Vol. 62 Issue 11, p4404, 2p, 2 Graphs
Abstrakt: Focuses on a study which examined the donor formation in heat-treated phosphorus-doped Czochralski-grown silicon by electron paramagnetic resonance and resistivity measurements. Proposal for oxygen clusters in thermal donors; Function of annealing time; Kind of transformation that the Si-NL10 spectrum undergoes.
Databáze: Complementary Index