The formation and annealing of dislocation damage from high-dose self-ion implantation of aluminum.
| Autor: | Vardiman, R. G. |
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| Zdroj: | Journal of Applied Physics; 6/1/1992, Vol. 71 Issue 11, p5386, 5p, 2 Black and White Photographs, 4 Graphs |
| Abstrakt: | Presents a study which examined the formation and annealing of dislocation damage from high-dose self-ion implantation of aluminum. Models of dislocation network growth; Experimental methods; Results. |
| Databáze: | Complementary Index |
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