Silicon-on-insulator material formed by oxygen implantation and high-temperature annealing: Carrier transport, oxygen activity, and interface properties.

Autor: Cristoloveanu, S., Gardner, S., Jaussaud, C., Margail, J., Auberton-Hervé, A. J., Bruel, M.
Předmět:
Zdroj: Journal of Applied Physics; 10/1/1987, Vol. 62 Issue 7, p2793, 6p, 6 Graphs
Abstrakt: Presents a study that examined the electrical structure properties of structure fabricated on silicon-on-insulator material formed by deep oxygenation implantation. Background on carrier-transport properties; Analysis of oxygen-related donors; Investigation of interface properties.
Databáze: Complementary Index