On the origin of misfit dislocations in InGaAs/GaAs strained layers.

Autor: Dixon, R. H., Goodhew, P. J.
Předmět:
Zdroj: Journal of Applied Physics; 10/1/1990, Vol. 68 Issue 7, p3163, 6p
Abstrakt: Presents a study which examined the In[subx]Ga[sub1-x]As/GaAs (x<0.25) strained layers grown by molecular-beam epitaxy using plan-view transmission electron microscopy. Details on the experiment; Results and discussion; Conclusion.
Databáze: Complementary Index