Role of in situ rapid isothermal processing in advanced III-V technology.
| Autor: | Thakur, R. P. S., Singh, R., Nelson, A. J., Swartzlander, A. B. |
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| Zdroj: | Journal of Applied Physics; 10/1/1991, Vol. 70 Issue 7, p3857, 5p, 2 Black and White Photographs, 1 Chart, 6 Graphs |
| Abstrakt: | Presents a study which examined the role of in situ rapid isothermal processing in advanced III-V technology. Experimental procedures used; Current voltage measurements on the Schottky diodes; Results and discussion. |
| Databáze: | Complementary Index |
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